Patent · US Expired

Sputtering system for cathode sputtering apparatus

US4619755A · kind A · utility

19Cited by

6References

5Claims

0Family size

Assignee

Hans Zapfe · DE

Inventors

Gerhard Hessberger · Karlstein, DE
Michael Scherer · Crimmitschau, DE

Key dates

Filing date	Jul 25, 1985
Grant date	Oct 28, 1986
Priority date	—
Expiry date	Jul 25, 2005

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/34
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

Sputtering system for cathode sputtering apparatus, having a cathode base body with a target of the material to be sputtered. In the marginal part of the target an anode is disposed which is provided with at least one groove. For the solution of the problem of obtaining stable operating conditions in the lengthy coating of substrates with insulating materials and of drawing a high portion of the cathode current to the anode for a long period of time, the at least one groove opens, in accordance with the invention, on a side of the anode that is not in line of sight with the target.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.