Dry-processing apparatus
US4624214A · kind A · utility
19Cited by
9References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 10, 1985 |
| Grant date | Nov 25, 1986 |
| Priority date | — |
| Expiry date | Jun 10, 2005 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3053
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In a dry-processing apparatus adapted for vapor phase deposition or vapor phase etching, the processing space in its processing chamber is covered with a cooled member provided for trapping reflecting active particles and preventing degassing, thereby permitting processing with gas of high purity substantially free from impurities. The active particles are incident upon a workpiece in a unidirectional flow. Means for uniformalyzing the direction of movement of active particles may be further provided. The apparatus is especially useful for vertical etching of a semiconductor substrate with neutral radicals.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.