Inventor · Ome, JP

Sadayuki Okudaira

33Patents
19h-index
48Co-inventors
81Inventor score

Filing activity: Apr 15, 1977 → Mar 8, 2002

Most-cited inventions

PatentTitleAreaCited byStatus
US4579623A Method and apparatus for surface treatment by plasma Electricity 595 Expired
US4985114A Dry etching by alternately etching and depositing Emerging Cross-Sectional Technologies 545 Expired
US4857137A Process for surface treatment Electricity 497 Expired
US4992136A Dry etching method Electricity 233 Expired
US4481229A Method for growing silicon-including film by employing plasma deposition Chemistry; Metallurgy 129 Expired
US4563240A Method and apparatus for plasma process Electricity 99 Expired
US4599135A Thin film deposition Chemistry; Metallurgy 62 Expired
US5354416A Dry etching method Electricity 56 Expired
US4609426A Method and apparatus for monitoring etching Physics 47 Expired
US4462863A Microwave plasma etching Electricity 45 Expired
US4330384A Process for plasma etching Electricity 38 Expired
US4433228A Microwave plasma source Electricity 33 Expired
US4559100A Microwave plasma etching apparatus Electricity 32 Expired
US4943344A Etching method Electricity 31 Expired
US4986877A Method of dry etching Electricity 30 Expired
US4298419A Dry etching apparatus Chemistry; Metallurgy 30 Expired
US4705595A Method for microwave plasma processing Electricity 27 Expired
US4101411A Plasma etching apparatus Electricity 26 Expired
US5147500A Dry etching method Electricity 24 Expired
US4624214A Dry-processing apparatus Electricity 19 Expired
US4430138A Microwave plasma etching apparatus having fan-shaped discharge Electricity 17 Expired
US5580420A Plasma generating method and apparatus and plasma processing method and apparatus Electricity 17 Expired
US4844767A Method of and apparatus for etching Electricity 16 Expired
US5874013A Semiconductor integrated circuit arrangement fabrication method Electricity 13 Expired
US5643473A Dry etching method Electricity 12 Expired

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.