Method of repairing a defective photomask
US4636403A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Apr 29, 1985 |
| Grant date | Jan 13, 1987 |
| Priority date | — |
| Expiry date | Apr 29, 2005 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/146
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process of laser-induced metal deposition for repairing transparent defects (18) in patterned metal films (14) of photomasks (10). The process comprises the steps of (a) coating the surface (16) of the substrate (12) having the film (14) thereon with a layer of metal-organic compound (50); (b) exposing the portions of the layer of metal-organic compound (50) overlying the defects (18) to a beam (24) of electromagnetic radiation from a laser (22); (c) ramping the power level of the radiation beam (24) delivered by the laser (22) until a metal patch (52) is reflective and adherent is formed; and (d) removing the unexposed portions of metal-organic compound (50) remaining on the substrate surface (16).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.