Michal E. Gross
8Patents
8h-index
11Co-inventors
62Inventor score
Filing activity: Apr 29, 1985 → Jun 5, 2001
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4851895A | Metallization for integrated devices | Electricity | 53 | Expired |
| US6297154A | Process for semiconductor device fabrication having copper interconnects | Electricity | 53 | Expired |
| US6458696B1 | Plated through hole interconnections | Electricity | 44 | Expired |
| US6639724B2 | Device having a barrier layer located therein and a method of manufacture therefor | Physics | 32 | Expired |
| US4636403A | Method of repairing a defective photomask | Emerging Cross-Sectional Technologies | 31 | Expired |
| US6380083B1 | Process for semiconductor device fabrication having copper interconnects | Electricity | 19 | Expired |
| US5230970A | Method of forming metal regions | Emerging Cross-Sectional Technologies | 8 | Expired |
| US5416063A | Method of producing a layer of superconductive oxide | Emerging Cross-Sectional Technologies | 8 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.