Ellipsometric method and apparatus for studying physical properties of the surface of a testpiece
US4655595A · kind A · utility
43Cited by
1References
22Claims
0Family size
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Key dates
| Filing date | Sep 19, 1985 |
| Grant date | Apr 7, 1987 |
| Priority date | — |
| Expiry date | Sep 19, 2005 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/211
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
In an ellipsometric method and apparatus which, in order to increase the degree of measuring accuracy, uses the principle of comparative ellipsometry in measuring a characteristic such as a layer thickness, a reference surface is divided into first and second equal surface portions with respectively different reflection characteristics which are in substantially symmetrical relationship to the reflection characteristics of the testpiece, the surface portions preferably comprising two different tapering surface layers extending in parallel relationship to each other.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.