Positive tone oxygen plasma developable photoresist
US4657845A · kind A · utility
76Cited by
8References
10Claims
0Family size
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Key dates
| Filing date | Jan 14, 1986 |
| Grant date | Apr 14, 1987 |
| Priority date | — |
| Expiry date | Jan 14, 2006 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/039
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive tone photoresist is obtained without a solvent development step. The resist is a polymer containing masked reactive functionality which is imagewise exposed to unmask the functionality then treated with a non-organometallic reagent to remask that functionality. Following flood exposure, the resist is treated with an organometallic reagent containing an element which forms a non-volatile oxide. It is then developed by means of oxygen reactive ion etching.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.