Ion source
US4658143A · kind A · utility
23Cited by
7References
33Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 14, 1985 |
| Grant date | Apr 14, 1987 |
| Priority date | — |
| Expiry date | Mar 14, 2005 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J27/18
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An ion source equipped with an ion beam exit slit for extracting ions from plasma generated in feed gas introduced into a discharge chamber, and with gas inlet or inlets for introducing the feed gas into the discharge chamber in close proximity of the ion beam exit slit. Ion extraction can be made stably without any deposit on the ion beam exit slit even when a boron halide is used as the feed gas. The effect of the ion source can be further enhanced by adding oxygen, hydrogen or gas of an oxygen-containing compound to the feed gas, and by using a microwave.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.