Photosensitive element comprising a substrate and an alkaline soluble mixture
US4666820A · kind A · utility
13Cited by
6References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 12, 1985 |
| Grant date | May 19, 1987 |
| Priority date | — |
| Expiry date | Aug 12, 2005 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07J51/00
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Photosensitive bodies that are sensitive to ultraviolet radiation and that exhibit excellent contrast are formed from base soluble polymers such as poly(methyl methacrylate-co-methacrylic acid) physically mixed with base insoluble materials such as o,o'-dinitrobenzyl esters. The base insoluble esters decompose upon irradiation to form base soluble entities in the irradiated regions. These irradiated portions are then soluble in basic solutions that are used to develop the desired image.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.