Microlithographic reticle positioning system
US4667415A · kind A · utility
35Cited by
5References
5Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 29, 1985 |
| Grant date | May 26, 1987 |
| Priority date | — |
| Expiry date | Nov 29, 2005 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y35/00
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
In the reticle positioning system disclosed herein, a unitary structure is machined to form both a frame for holding a reticle and a compound linkage permitting lateral and rotational movement of the frame within its own plane under the control of three servo motors generating controllable displacements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.