Alignment and exposure apparatus
US4669867A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 14, 1985 |
| Grant date | Jun 2, 1987 |
| Priority date | — |
| Expiry date | Feb 14, 2005 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An alignment and exposure apparatus in which sequential operations of pattern projection for projecting a pattern of a first object, at a reduced ratio, onto a second object through an optical system, stepwise movement for moving the second object stepwise relative to the first object, detection for detecting any positional deviation between the first and second objects at a position at which the stepwise movement of the second object is terminated, and correction for correcting the positional relation between the first and second objects on the basis of the detected positional deviation, are repeated relative to the second object to thereby print the patterns onto the second object in a reduced scale. Upon correction of the positional relation between the first and second objects, at least one of the first and second objects is displaced in accordance with the magnitude of the detected positional deviation and/or, upon stepwise movement of the second object, the amount of stepwise movement to be made is corrected in accordance with the detected positional deviation with respect to the position at which the preceding stepwise movement of the second object is terminated. By this, th…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.