Method of information recording on a semiconductor wafer
US4672578A · kind A · utility
4Cited by
7References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 22, 1984 |
| Grant date | Jun 9, 1987 |
| Priority date | — |
| Expiry date | Feb 22, 2004 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B2007/25715
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
An information recording method is provided, in which a p- or n-type semiconductor wafer is irradiated with an energetic particle beam such as an electron beam thereby to control, e.g., decreased or increased generation of the surface photovoltage at the irradiated area so that information may be recorded on the wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.