Electrophotographic sensitive member with amorphous Si barrier layer
US4675264A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Jul 15, 1986 |
| Grant date | Jun 23, 1987 |
| Priority date | — |
| Expiry date | Jul 15, 2006 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03G5/08242
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention relates to improvements in an electrophotographic sensitive member having a photoconductive layer formed with amorphous silicon produced by glow discharge decomposition or sputtering. An electrophotographic sensitive member is formed by laminating an amorphous silicon barrier layer and an amorphous photoconductive layer successively on an electrically conductive substrate, the first mentioned layer containing an impurity of Group IIIa of Periodic Table of Elements, or nitrogen and impurity of Group IIIa of same Table, and also containing oxygen within a range of 0.1 to 20.0 atomic % at the point of the layer and in a progressively decreasing pattern throughout the rest thereof. Constructed as such, the photosensitive member has an increased photosensitivity to near-infrared beams, a large charge-holding capability, and low-rate dark attenuation characteristics. In addition, it is less expensive to manufacture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.