Apparatus for simultaneous molecular beam deposition on a plurality of substrates
US4681773A · kind A · utility
52Cited by
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10Claims
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Key dates
| Filing date | Apr 4, 1986 |
| Grant date | Jul 21, 1987 |
| Priority date | — |
| Expiry date | Apr 4, 2006 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/139
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Apparatus is described which is especially well suited for simultaneous molecular beam epitaxy of materials, such as silicon, on a plurality of substrates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.