Positive acting resist material comprised of novoloc resin derived from phenylphenol
US4690882A · kind A · utility
9Cited by
5References
8Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 25, 1985 |
| Grant date | Sep 1, 1987 |
| Priority date | — |
| Expiry date | Sep 25, 2005 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0236
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A mixture of an alkali soluble resin and either a quinonediazide compound or poly(2-methylpentene-1-sulfone provides a positive acting resist material, which is very high in a critical exposure dose at which the resist begins to gel by radiation-induced crosslinking. By using this resist material in direct delineation of patterns with ionizing radiation, the problem of gelling of the resist film in the areas repeatedly scanned for the detection of the alignment marks is obviated. A novolac resin comprising a t-butylphenol or phenylphenol segment is suitable as the alkali soluble resin.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.