Clean room
US4693173A · kind A · utility
25Cited by
3References
15Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Oct 11, 1985 |
| Grant date | Sep 15, 1987 |
| Priority date | — |
| Expiry date | Oct 11, 2005 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF24F7/10
- WIPO fieldThermal processes and apparatus
- WIPO sectorMechanical engineering
Abstract
A clean room wherein clean air obtained through filters from the upper portion of the clean room is blown toward the floor, through the openings in the floor, and with the clean air being discharged again through the filters from the upper portion of the clean room. The air flow rate of clean air in the aisle areas is greater than the air flow rate in the wafer handling areas, and the opening rate of the floor is smaller in the portion near to an air return under the floor than in the portion remote from the air return thereby greatly reducing the diffusion of dust to the wafer handling areas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.