System for optimizing process parameters in photoactive semiconductor manufacturing in-situ

US4700311A · kind A · utility

Assignee

• Hahn-Meitner-Institut fur Kernforschung Berlin GmbH · DE

Inventors

• Helmut Tributsch · Berlin, DE
• Gerhard Beck · Berlin, DE
• Marinus Kunst · Berlin, DE
• Udo Kuppers · Berlin, DE
• Hans-Joachim Lewerenz · Maplewood, US
• Jochen Lilie · Berlin, DE
• Andre Werner · Munich, DE

Key dates

• Filing date: Jan 25, 1985
• Grant date: Oct 13, 1987
• Expiry date: Jan 25, 2005

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S136/29

Abstract

Materials and systems substantially having photoactive properties are produced with a high quality output and without time losses in the fabrication process. To determine the quality of the photoactive material in situ, conductivity is induced in the material by exciting charge carriers through irradiation, and an electromagnetic field influenced thereby is measured, with the result of the measurement being evaluated by a computer with a corresponding control of actuating members such as valves and controllers. Optimum process parameters are thus found and used for the process.