Method of depositing thin films using microwave energy
US4701343A · kind A · utility
6Cited by
2References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 13, 1986 |
| Grant date | Oct 20, 1987 |
| Priority date | — |
| Expiry date | Aug 13, 2006 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0262
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An improved method of depositing thin films onto a substrate with microwave energy by operating at substantially the minimum of the pressure-power curve for the particular geometry of reaction vessel and composition of reaction gases being utilized.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.