Photomask having a patterned carbon light-blocking coating
US4704342A · kind A · utility
13Cited by
16References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 2, 1985 |
| Grant date | Nov 3, 1987 |
| Priority date | — |
| Expiry date | Apr 2, 2005 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/146
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photomask for use in manufacturing integrated circuits is fabricated by coating a thin film of organic material, generally a solution of a thermally decomposable hydrocarbon, onto a glass plate and heating it in a reducing atmosphere to convert it into carbon. The carbon layer is masked and etched; for example, in an oxygen plasma, to produce the mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.