Plasma CVD apparatus
US4707210A · kind A · utility
7Cited by
8References
1Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 28, 1986 |
| Grant date | Nov 17, 1987 |
| Priority date | — |
| Expiry date | Apr 28, 2006 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4401
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A plasma chemical vapor deposition apparatus comprises internal construction members comprising aluminum having surfaces exposed to a plasma atmosphere.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.