Patent · US Expired

Scanning particle microscope

US4713543A · kind A · utility

28Cited by

6References

23Claims

0Family size

Assignee

Siemens Aktiengesellschaft · DE

Inventors

Hans-Peter Feuerbaum · Hersbruck, DE
Juergen Frosien · Ottobrunn, DE
Rainer Spehr · Ober-Ramstadt, DE

Key dates

Filing date	Jul 2, 1985
Grant date	Dec 15, 1987
Priority date	—
Expiry date	Jul 2, 2005

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/28
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

There is disclosed a scanning particle microscope in which the adverse influence of the Boersch effect is reduced. This is achieved by providing an elastrostatic retardation element in the particle optics unit to decelerate the particle from a first energy, at which the particles are generated, to a second energy which is less than half of the first energy.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.