Process of laminating a photosensitive layer of a substrate
US4714504A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 10, 1986 |
| Grant date | Dec 22, 1987 |
| Priority date | — |
| Expiry date | Oct 10, 2006 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T156/1744
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for laminating discrete sections of a supported photosensitive layer onto a continuing series of sheet substrates. Each substrate is advanced to and through the nip of heated application rolls, and a continuous length of the supported photosensitive layer is also supplied to the nip. When the substrate reaches a first location positioned between the application rolls, all movement ceases except that the rolls move from an inactive disengaged position toward the substrate to an active position to cause pressure contact between the photosensitive layer and the substrate to thereby laminate the photosensitive layer to the substrate. There is a pause for a predetermined period of time with the rolls in the active positions before the substrate is again advanced with the rolls still in the active positions and the photosensitive layer again supplied to the nip. When the substrate reaches a second location, all motion ceases once again and there is another pause for another predetermined period of time with the rolls in the active positions after which the rolls are withdrawn to an inactive position. During the second pause, a successive substrate continues to advance toward th…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.