Mask for patterning electrode structures in thin film EL devices
US4715940A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Oct 23, 1985 |
| Grant date | Dec 29, 1987 |
| Priority date | — |
| Expiry date | Oct 23, 2005 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/143
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A shadow mask is provided which can provide a precise patterning to a deposit at process temperature without destruction of the shadow mask itself. The shadow mask consists of a plurality of metallic strips having a series of interconnecting small arched bridges that hold the strips of the mask together. The shadow mask is used in a process for depositing electrode structures in an electroluminescent device wherein the mask is positioned over a substrate surface to be coated and deposit electrode material is sprayed from a geometrically broad source, through the mask and onto the substrate. Deposition occurs beneath the arched bridges resulting in a pattern deposition that does not readily reveal the presence of bridges because sufficient material is coated beneath to provide cosmetic and electrical continuity between areas separated by the bridges. This invention is particularly suited for a mask designed to provide a fine pattern of closely spaced parallel lines or electrode structures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.