Method for providing impurities into a carrier gas line
US4717597A · kind A · utility
1Cited by
8References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 21, 1986 |
| Grant date | Jan 5, 1988 |
| Priority date | — |
| Expiry date | Mar 21, 2006 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/935
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A permeable tube is inserted in a processing gas line to allow impurities surrounding the permeable tube to enter the processing line. By plumbing a steel tube in parallel with the permeable tube the process carrier gas can be switched from one tube to the other in rapid succession to allow pure or impure gases to enter into a reaction chamber. This can permit the growth of alternating layers of differently doped materials. As an example, it has been discovered that incorportaing small amounts of oxygen into an AlGaAs layer will produce a semi-insulating layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.