Process and apparatus for plasma treatment
US4718976A · kind A · utility
52Cited by
8References
16Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 19, 1986 |
| Grant date | Jan 12, 1988 |
| Priority date | — |
| Expiry date | Aug 19, 2006 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/455
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process and apparatus for plasma treatment by the use of a plasma generating chamber and a separate treating chamber in which an activated gas, excited in the plasma generating chamber, is introduced into the treating chamber, distributed within the treating chamber by a gas diffusing plate, and then is brought into contact with a material to be treated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.