Shuzo Fujimura
42Patents
21h-index
36Co-inventors
85Inventor score
Filing activity: Sep 15, 1980 → Sep 21, 2000
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5961775A | Apparatus for removing organic resist from semiconductor | Physics | 463 | Expired |
| US5478403A | Process and apparatus for ashing treatment | Electricity | 229 | Expired |
| US4609428A | Method and apparatus for microwave plasma anisotropic dry etching | Electricity | 95 | Expired |
| US4512868A | Microwave plasma processing apparatus | Electricity | 58 | Expired |
| US4718976A | Process and apparatus for plasma treatment | Chemistry; Metallurgy | 52 | Expired |
| US4983254A | Processing for stripping organic material | Physics | 46 | Expired |
| US5057187A | Ashing method for removing an organic film on a substance of a semiconductor device under fabrication | Physics | 45 | Expired |
| US4961820A | Ashing method for removing an organic film on a substance of a semiconductor device under fabrication | Physics | 43 | Expired |
| US5403436A | Plasma treating method using hydrogen gas | Electricity | 43 | Expired |
| US5773201A | Method of stripping a resist mask | Physics | 38 | Expired |
| US5024748A | Microwave plasma processing apparatus | Emerging Cross-Sectional Technologies | 36 | Expired |
| US4393807A | Spinner | Physics | 36 | Expired |
| US4980022A | Method of removing a layer of organic matter | Physics | 32 | Expired |
| US4987284A | Downstream microwave plasma processing apparatus having an improved coupling structure between microwave plasma | Electricity | 32 | Expired |
| US5832177A | Method for controlling apparatus for supplying steam for ashing process | Chemistry; Metallurgy | 30 | Expired |
| US4861424A | Ashing process of a resist layer formed on a substrate under fabrication to a semiconductor device | Physics | 30 | Expired |
| US5397432A | Method for producing semiconductor integrated circuits and apparatus used in such method | Electricity | 29 | Expired |
| US4938839A | Method of removing photoresist on a semiconductor wafer | Physics | 28 | Expired |
| US5773316A | Method and device for measuring physical quantity, method for fabricating semiconductor device, and method and device for measuring wavelength | Electricity | 26 | Expired |
| US4423127A | Method of manufacturing a semiconductor device | Electricity | 24 | Expired |
| US5364519A | Microwave plasma processing process and apparatus | Electricity | 22 | Expired |
| US5885361A | Cleaning of hydrogen plasma down-stream apparatus | Performing Operations; Transporting | 20 | Expired |
| US5595916A | Silicon oxide film evaluation method | Electricity | 19 | Expired |
| US6007671A | Method for hydrogen plasma down-flow processing and apparatus thereof | Electricity | 16 | Expired |
| US6063300A | Method of manufacturing semiconductor device including light etching | Electricity | 16 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.