Shared current loop, multiple field apparatus and process for plasma processing
US4738761A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 6, 1986 |
| Grant date | Apr 19, 1988 |
| Priority date | — |
| Expiry date | Oct 6, 2006 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3405
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A shared current loop, multiple field apparatus and process for magnetron gas discharge processing is disclosed. The apparatus includes an evacuable chamber for containing a reactant gas. A multi-part cathode associated with a current loop generates multiple, independent electrical fields. The cathode comprises a first cathode portion for generating a first electric field that forms a gas discharge including ions. The second cathode portion generates a second, independent electric field. The second electric field extracts ions from the gas discharge, and may also control the energy with which the extracted ions strike an item to be processed. Each cathode portion is electrically insulated from the other and may be connected to a separate power source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.