Stephen M. Bobbio
33Patents
13h-index
30Co-inventors
81Inventor score
Filing activity: Aug 11, 1983 → Apr 12, 2013
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5206557A | Microelectromechanical transducer and fabrication method | Electricity | 114 | Expired |
| US6420814B1 | Spiral wound transducer | Electricity | 91 | Expired |
| US4921157A | Fluxless soldering process | Performing Operations; Transporting | 72 | Expired |
| US5563466A | Micro-actuator | Electricity | 57 | Expired |
| US5001594A | Electrostatic handling device | Electricity | 49 | Expired |
| US5045166A | Magnetron method and apparatus for producing high density ionic gas discharge | Performing Operations; Transporting | 44 | Expired |
| US5499754A | Fluxless soldering sample pretreating system | Electricity | 33 | Expired |
| US5147520A | Apparatus and method for controlling processing uniformity in a magnetron | Performing Operations; Transporting | 29 | Expired |
| US5609290A | Fluxless soldering method | Performing Operations; Transporting | 28 | Expired |
| US4615764A | SF6/nitriding gas/oxidizer plasma etch system | Electricity | 27 | Expired |
| US4465552A | Method of selectively etching silicon dioxide with SF.sub.6 /nitriding component gas | Electricity | 27 | Expired |
| US5290400A | Fabrication method for microelectromechanical transducer | Electricity | 26 | Expired |
| US6144370A | Electromagnetic active trackball control system using magnets energized in sequence which cause the trackball to move | Physics | 20 | Expired |
| US4582581A | Boron trifluoride system for plasma etching of silicon dioxide | Electricity | 12 | Expired |
| US5434464A | Unidirectional supporting structure for microelectromechanical transducers | Electricity | 12 | Expired |
| US5248760A | Chemically cured low temperature polyimides | Chemistry; Metallurgy | 12 | Expired |
| US5479061A | Pleated sheet microelectromechanical transducer | Electricity | 12 | Expired |
| US5393642A | Ionic modification of organic resins and photoresists to produce photoactive etch resistant compositions | Emerging Cross-Sectional Technologies | 11 | Expired |
| US4826754A | Method for anisotropically hardening a protective coating for integrated circuit manufacture | Emerging Cross-Sectional Technologies | 11 | Expired |
| US5615825A | Fluorinated fluxless soldering | Electricity | 10 | Expired |
| US4968582A | Photoresists resistant to oxygen plasmas | Emerging Cross-Sectional Technologies | 10 | Expired |
| US5064748A | Method for anisotropically hardening a protective coating for integrated circuit manufacture | Emerging Cross-Sectional Technologies | 7 | Expired |
| US5114827A | Photoresists resistant to oxygen plasmas | Physics | 7 | Expired |
| US4738761A | Shared current loop, multiple field apparatus and process for plasma processing | Electricity | 7 | Expired |
| US7891145B1 | Spool-mounted coiled structural extending member | Physics | 7 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.