Gallium hydride/trialkylamine adducts, and their use in deposition of III-V compound films
US4740606A · kind A · utility
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2Claims
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Key dates
| Filing date | Jul 1, 1986 |
| Grant date | Apr 26, 1988 |
| Priority date | — |
| Expiry date | Jul 1, 2006 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07F5/003
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Adduct of the formula: EQU H.sub.3 GaNR.sub.3 wherein each R is independently selected from lower alkyl having from 2 to about 4 carbon atoms, and a process for depositing gallium nitride, gallium arsenide, or gallium phosphide films, using the above adduct as a source of nitride (for the nitride film) and gallium. Arsenic and phosphorus compounds are also added for depositing gallium compounds of those elements. The process can also be performed using the analogous trimethylamine adduct.
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