Method for registration of shadow masked thin-film patterns
US4746548A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 23, 1985 |
| Grant date | May 24, 1988 |
| Priority date | — |
| Expiry date | Oct 23, 2005 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/682
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of aligning thin-film structure patterns on a substrate formed with the use of an apertured mask in a vacuum deposition system. The present method includes the steps of positioning a mask holder assembly within a deposition chamber, the mask holder assembly having the apertured mask as part thereof and having means for engaging a substrate carrier; positioning a substrate carrier within the deposition chamber spaced from the mask holder assembly, the carrier having the substrate supported therein and having means for aligning the apertured mask with the substrate; engaging the mask holder assembly with the substrate carrier such that they are in operative contact; positioning a magnet in the deposition chamber adjacent the side of the substrate carrier opposite the mask holder assembly such that the apertured mask is held in operative contact with the substrate; vacuum-depositing a thin-film structure material through the apertured mask; and removing the magnet from the substrate carrier and disengaging the mask holder assembly from the substrate carrier, thereby resulting in the formation of the thin-film structures on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.