X-ray lithography system
US4748646A · kind A · utility
13Cited by
1References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 18, 1987 |
| Grant date | May 31, 1988 |
| Priority date | — |
| Expiry date | Mar 18, 2007 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70808
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An X-ray lithography system, in which an X-ray beam is separated from synchrotron radiation beams and reflected by a scanning mirror which vertically scans the reflected X-ray beam. The X-ray is irradiated into an exposure chamber via a beryllium window, which is vertically oscillated in such a manner that the beryllium window is shifted up and down in synchronization with the scanning operation of the X-ray beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.