Equipment for thermal stabilization process of photoresist pattern on semiconductor wafer
US4749436A · kind A · utility
15Cited by
0References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 29, 1987 |
| Grant date | Jun 7, 1988 |
| Priority date | — |
| Expiry date | Jul 29, 2007 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/948
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An equipment (100; 200) for thermal stabilization process of photoresist pattern on semiconductor wafer comprises an ultraviolet lamp (20) by which a photoresist pattern formed on a semiconductor wafer (W) put in a process chamber (S) under vacuum pressure is irradiated with ultraviolet rays of a predetermined strength, and a heater (10) for heating the wafer to a predetermined temperature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.