Apparatus for processing wafers and the like
US4750505A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 25, 1986 |
| Grant date | Jun 14, 1988 |
| Priority date | — |
| Expiry date | Apr 25, 2006 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An apparatus for processing semiconductor substrates (i.e., wafers) or the like by rotation of the same. The apparatus includes: a housing which defines a processing chamber therein; and an exhaust duct connected to the lower side portion of the chamber. A rotary member is rotatably mounted in the chamber, on which a plurality of wafers to be processed are held. At the upper side portion within the chamber an auxiliary chamber is provided. Undesired objects, such as water remaining on the wafers and vapor and dirts sprung from the wafers, are effectively expelled from the chamber, through both the exhaust duct and the auxiliary chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.