DAINIPPON SCREEN MFG. CO., LTD.
1,372Patents
298Active
1,372Granted
51Portfolio score
Filing activity: Mar 8, 1978 → Jun 24, 2014 · 213 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5315092A | Apparatus for heat-treating wafer by light-irradiation and device for measuring temperature of substrate used in such apparatus | Electricity | 563 | Expired |
| US8608885B2 | Substrate heat treatment apparatus | Electricity | 533 | Active |
| US5989342A | Apparatus for substrate holding | Emerging Cross-Sectional Technologies | 493 | Expired |
| US7432476B2 | Substrate heat treatment apparatus | Electricity | 469 | Active |
| US8003919B2 | Substrate heat treatment apparatus | Electricity | 456 | Active |
| US7062161B2 | Photoirradiation thermal processing apparatus and thermal processing susceptor employed therefor | Electricity | 452 | Expired |
| US4693211A | Surface treatment apparatus | Chemistry; Metallurgy | 408 | Expired |
| US5022961A | Method for removing a film on a silicon layer surface | Emerging Cross-Sectional Technologies | 399 | Expired |
| US6843202B2 | Thermal processing apparatus for substrate employing photoirradiation | Electricity | 376 | Expired |
| US4925388A | Apparatus for heat treating substrates capable of quick cooling | Mechanical Engineering; Lighting; Heating | 332 | Expired |
| US6806897B2 | Image recording apparatus using the grating light valve | Performing Operations; Transporting | 230 | Expired |
| US5571325A | Subtrate processing apparatus and device for and method of exchanging substrate in substrate processing apparatus | Emerging Cross-Sectional Technologies | 171 | Expired |
| US5520744A | Device for rinsing and drying substrate | Emerging Cross-Sectional Technologies | 139 | Expired |
| US5881211A | Data conversion table changing | Electricity | 128 | Expired |
| US4788994A | Wafer holding mechanism | Emerging Cross-Sectional Technologies | 127 | Expired |
| US5678116A | Method and apparatus for drying a substrate having a resist film with a miniaturized pattern | Physics | 121 | Expired |
| US5288333A | Wafer cleaning method and apparatus therefore | Electricity | 118 | Expired |
| US4871417A | Method and apparatus for surface treating of substrates | Emerging Cross-Sectional Technologies | 117 | Expired |
| US5120966A | Method of and apparatus for measuring film thickness | Physics | 116 | Expired |
| US4799175A | System for inspecting pattern defects of printed wiring boards | Physics | 112 | Expired |
| US5373786A | Metal mask plate for screen printing | Electricity | 102 | Expired |
| US7026832B2 | Probe mark reading device and probe mark reading method | Physics | 99 | Expired |
| US5032217A | System for treating a surface of a rotating wafer | Emerging Cross-Sectional Technologies | 97 | Expired |
| US4870923A | Apparatus for treating the surfaces of wafers | Chemistry; Metallurgy | 93 | Expired |
| US6051101A | Substrate processing apparatus, substrate transport apparatus and substrate transfer apparatus | Electricity | 91 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.