Image-forming materials sensitive to high-energy beam
US4756989A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 10, 1985 |
| Grant date | Jul 12, 1988 |
| Priority date | — |
| Expiry date | Jul 10, 2005 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0757
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is an image-forming material having a high sensitivity to high-energy beams and excellent in dry etching resistance, heat stability and resolution which comprises a copolymer containing a total of 1 to 99 mole-% of at least one of recurring structural units represented by the following formulas [A] and [A'] and 1 to 99 mole-% of at least one recurring structural unit represented by the following formula [B] and having a number-average molecular weight of 500 to 1,000,000: ##STR1## wherein R.sub.1 of the formulas [A] and [A'] represents a hydrogen or halogen atom, or an alkyl group having 1 to 6 carbon atoms, the substituent groups R.sub.1, epoxy group, and thiiranyl group being attached to the position ortho, meta, or para to the carbon atom in the main chain; X, Y, and Z of the formula [B] represent each a hydrogen atom, halogen atom, cyano group, alkyl group having 1 to 6 carbon atoms, halogenated alkyl group having 1 to 6 carbon atoms, aryl group having 6 to 30 carbon atoms and bearing a substituent alkyl or halogenated alkyl group having 1 to 6 carbon atoms, aryl group having 6 to 30 carbon atoms, --COOR.sub.2, --COR.sub.2, --O--COR.sub.2 (wherein R.sub.2 represents a…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.