Hideo Ai
13Patents
8h-index
16Co-inventors
65Inventor score
Filing activity: Jul 26, 1977 → Aug 5, 1988
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5019482A | Polymer/oxime ester/coumarin compound photosensitive composition | Physics | 37 | Expired |
| US4778859A | Tetramine derived polyimide with pendant unsaturation, and various photosensitive compositions therefrom | Chemistry; Metallurgy | 29 | Expired |
| US4754016A | Process for preparing polyamide with organic phosphine/organic disulfide mixture condensing agent | Chemistry; Metallurgy | 16 | Expired |
| US4702997A | Photopolymerizable laminate | Physics | 14 | Expired |
| US4839261A | Photocurable laminate | Physics | 13 | Expired |
| US4645823A | Polyamide preparation from polycarboxylic acid and polyamine with carbodiimide condensing agent | Chemistry; Metallurgy | 12 | Expired |
| US4767797A | Photocurable compositions of poly(ethynylphenyl)acetylene, its copolymer and composition thereof | Chemistry; Metallurgy | 11 | Expired |
| US4447580A | Resin composition, coating material comprising said resin composition and method for forming coatings | Emerging Cross-Sectional Technologies | 9 | Expired |
| USD303673S | Shearing machine | General | 7 | Expired |
| US4528332A | Epoxy compounds, process for the preparation thereof and resist materials comprising thereof | Emerging Cross-Sectional Technologies | 7 | Expired |
| US4667006A | Poly(ethynylphenyl)acetylene, its copolymer and composition thereof | Chemistry; Metallurgy | 6 | Expired |
| US4756989A | Image-forming materials sensitive to high-energy beam | Physics | 6 | Expired |
| US4122269A | 1,3,6-Tris(4,6-diamino-1,3,5-triazine-2-yl)hexane | Chemistry; Metallurgy | 6 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.