Recessed-gate junction-MOS field effect transistor
US4769685A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 27, 1986 |
| Grant date | Sep 6, 1988 |
| Priority date | — |
| Expiry date | Oct 27, 2006 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D30/63
Abstract
An insulated gate field effect transistor of the depletion mode type has a recessed gate structure with opposed gate sections on opposite sides of adjacent bar-like structures defined in a channel region. An opposite conductivity-type island in the channel region is electrically connected to the transistor gate electrode. A voltage applied to the gate electrode generates an electric field effect which extends from the opposed gate sections into said bar-like structures creating opposed depletion regions which modulate channel current. The gate voltage simultaneously biases the island to enhance the gate electric field effect by removing minority charge carriers which would otherwise accumulate in the bar-like structures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.