Plasma product treatment apparatus and methods and gas transport systems for use therein
US4776923A · kind A · utility
11Cited by
9References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 20, 1987 |
| Grant date | Oct 11, 1988 |
| Priority date | — |
| Expiry date | Jan 20, 2007 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32871
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In semiconductor treatment apparatus with a plasma generating zone, a treatment zone, and a bent path connecting the two so as to block direct transmission of ultraviolet light from the plasma generating zone to the workpiece in the treatment zone, a light trap is provided to suppress indirect transmission of light as by reflection or by transmission within transparent walls of a conduit defining the bent path.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.