Process for producing color filter using alignment marks
US4777117A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 30, 1986 |
| Grant date | Oct 11, 1988 |
| Priority date | — |
| Expiry date | Oct 30, 2006 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process for producing a color filter having plural number of colorant layer patterns by repeating, for each of a plural number of starting materials for colorant layer, the steps of subjecting a substrate having a photoresist laminated thereon to pattern exposure to effect patterning of said photo-resist, laminating a colorant layer from said photoresist above and removing the layer of said photoresist having said colorant layer laminated thereon by dissolution to form a colorant layer pattern, comprises forming an alignment mark on said substrate with the same starting material as a first colorant layer pattern simultaneously with formation of said first colorant layer pattern and performing registration of the mask during formation of a second colorant layer pattern et seq. through said alignment mark.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.