Projection exposure apparatus
US4780747A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 30, 1987 |
| Grant date | Oct 25, 1988 |
| Priority date | — |
| Expiry date | Jan 30, 2007 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70891
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A projection exposure apparatus includes illuminating means for applying energy rays to a mask having a predetermined pattern formed thereon, a projection optical system for forming the image of the pattern in a predetermined projected state on a responsive substrate, adjusting means for correcting the fluctuation of the projected state of the image caused by the passage of the energy rays, exposure control means for controlling the energy rays so that the pojected image of the pattern by the projection optical system is transferred onto the responsive substrate under a predetermined exposure condition, means for making information regarding the reflectivity of the responsive substrate, and main control means for controlling the adjusting means on the basis of the predetermined exposure condition of the exposure control means and the information regarding the reflectivity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.