Process for the formation of phosphosilicate glass coating
US4781945A · kind A · utility
11Cited by
4References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 23, 1987 |
| Grant date | Nov 1, 1988 |
| Priority date | — |
| Expiry date | Jun 23, 2007 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02271
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A coating of phosphosilicate glass is deposited on a substrate by a chemical vapor deposition method, using a reaction gas consisting of monosilane, phosphine, and oxygen, in admixture with ammonia gas. According to this deposition process, the undesirable formation and adhesion of particulate by-products such as SiO.sub.2, P.sub.2 O.sub.5, and H.sub.2 SiO.sub.3 to the substrate surface can be effectively prevented, and the step coverage can be improved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.