Substrate surface deflecting device
US4788577A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 11, 1988 |
| Grant date | Nov 29, 1988 |
| Priority date | — |
| Expiry date | Jan 11, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70691
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus comprises a stage; a base plate provided on the stage; a flexible chuck plate which is capable of sucking under vacuum a substantially entire surface of a substrate to a surface thereof; a plurality of vertical displacement generating mechanism including a plurality of feedscrews provided at the base plate with predetermined intervals therebetween, a plurality of rotational actuators for rotatively driving each of the feedscrews, and a plurality of spring members interposed between the chuck plate and the base plate so as to allow a tip of each of the feedscrews to be engaged with a rear surface of the chuck plate; restricting mechanism for restricting the chuck plate in such a manner as not to be displaced horizontally relative to the base plate; a mask holder for holding a mask; a mechanism for measuring a level of the mask held by the mask holder; and a mechanism for measuring a level of the substrate sucked onto the chuck plate, whereby each of the rotational actuators of the vertical displacement generating mechanism is driven on the basis of gaps between the mask and the substrated measured by the mechanism for measuring the level of the mask and the mec…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.