Method of projecting photoelectron image
US4789786A · kind A · utility
6Cited by
7References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 15, 1988 |
| Grant date | Dec 6, 1988 |
| Priority date | — |
| Expiry date | Jan 15, 2008 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31779
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method for projecting a photelectron image includes providing a mask substrate, and selectively contacting a layer which lowers the work function of the mask substrate thereto. Photoelectrons are emitted from the contacted portion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.