Gas dispersion disk for use in plasma enhanced chemical vapor deposition reactor
US4792378A · kind A · utility
275Cited by
3References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 15, 1987 |
| Grant date | Dec 20, 1988 |
| Priority date | — |
| Expiry date | Dec 15, 2007 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3244
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A chemical vapor transport reactor gas dispersion disk (20) for counteracting vapor pressure gradients to provide a uniform deposition of material films on a semiconductor slice (37). The disk (20) has a number of apertures (22) arranged so as to increase in aperture area per unit of disk area when extending from the center of the disk (20) to its outer peripheral edge.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.