Photosensitive composition
US4792516A · kind A · utility
9Cited by
8References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 5, 1987 |
| Grant date | Dec 20, 1988 |
| Priority date | — |
| Expiry date | Jan 5, 2007 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0085
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive composition comprising (a) a photosensitive component such as an aromatic diazo compound or an aromatic azide, (b) a polymer and (c) a quaternary alkylammonium salt wherein each straight- or branched-chain alkyl group has 1 to 7 carbon atoms is suitable for producing a positive type or negative type photresist excellent in contrast and sensitivity in the microlithography of semiconductor elements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.