Polymerizable film and pattern forming method by use thereof
US4798740A · kind A · utility
16Cited by
5References
47Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 26, 1987 |
| Grant date | Jan 17, 1989 |
| Priority date | — |
| Expiry date | Mar 26, 2007 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/029
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A polymerizable film is provided which comprises a transition metal and a polymerizable compound, and having a solubility in a solvent which changes through a maximum and a minimum repeatedly with an increase in energy imparted for polymerization. The polymerized film may comprise a polymerizable compound represented by the formula: EQU R--C.tbd.C--C.tbd.C--(R.sub.1).sub.n --X wherein R and R.sub.1 are hydrophobic sites, X is a hydrophilic site, and n is 0 or 1. This polymerizable film is useful as recording materials and resist materials.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.