Inventor · Yokohama, JP

Kenji Saitoh

79Patents
19h-index
76Co-inventors
87Inventor score

Filing activity: Dec 15, 1986 → Sep 3, 2013

Most-cited inventions

PatentTitleAreaCited byStatus
US5721721A Two scanning probes information recording/reproducing system with one probe to detect atomic reference location on a recording medium Emerging Cross-Sectional Technologies 66 Expired
US5625453A System and method for detecting the relative positional deviation between diffraction gratings and for measuring the width of a line constituting a diffraction grating Physics 64 Expired
US5114236A Position detection method and apparatus Physics 64 Expired
US5148036A Multi-axis wafer position detecting system using a mark having optical power Electricity 63 Expired
US5327221A Device for detecting positional relationship between two objects Physics 62 Expired
US5483343A Wavelength compensator in a helium ambience Physics 57 Expired
US5519686A Encoder for controlling measurements in the range of a few angstroms Emerging Cross-Sectional Technologies 49 Expired
US5333050A Measuring method and apparatus for meausring the positional relationship of first and second gratings Physics 48 Expired
US7217503B2 Exposure method and apparatus Physics 47 Expired
US5891773A Non-volatile semiconductor storage apparatus and production thereof Electricity 40 Expired
US7075455B2 Wireless communication apparatus and method Electricity 39 Expired
US5369486A Position detector for detecting the position of an object using a diffraction grating positioned at an angle Physics 36 Expired
US4895914A Surface treated polymethylsilsesquioxane powder Emerging Cross-Sectional Technologies 33 Expired
US7107573B2 Method for setting mask pattern and illumination condition Physics 28 Expired
US5524131A Alignment apparatus and SOR x-ray exposure apparatus having same Physics 28 Expired
US5200800A Position detecting method and apparatus Physics 27 Expired
US5162656A Position detecting device employing marks and oblique projection Physics 25 Expired
US5610718A Apparatus and method for detecting a relative displacement between first and second diffraction gratings arranged close to each other wherein said gratings have different pitch sizes Physics 23 Expired
US6154281A Position detecting system and device manufacturing method using the same Physics 20 Expired
US5682239A Apparatus for detecting positional deviation of diffraction gratings on a substrate by utilizing optical heterodyne interference of light beams incident on the gratings from first and second light emitters Physics 19 Expired
US6534242B2 Multiple exposure device formation Physics 19 Expired
US7901098B2 Illuminating apparatus and image sensing system including illuminating apparatus Physics 18 Active
US6157452A Position detecting apparatus Physics 18 Expired
US5822389A Alignment apparatus and SOR X-ray exposure apparatus having same Physics 18 Expired
US5313272A Method and apparatus for measuring deviation between patterns on a semiconductor wafer Physics 18 Expired

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.