Negative resist compositions
US4800152A · kind A · utility
6Cited by
6References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 16, 1987 |
| Grant date | Jan 24, 1989 |
| Priority date | — |
| Expiry date | Mar 16, 2007 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/128
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Heat stable, negative resist compositions are provided for use, particularly in deep ultraviolet light X-ray and electron beams. The composition comprises an acid generating onium salt photoinitiator, a source of polyfunctional activated aromatic rings and a source of polyfunctional carbonium ions, with at least one of said sources being a polymer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.