Patent · US Expired

Method for the formation of a diffraction grating

US4806454A · kind A · utility

42Cited by
3References
4Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 24, 1987
Grant dateFeb 21, 1989
Priority date
Expiry dateJun 24, 2007

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S359/90
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method for the formation of a diffraction grating on a substrate using a holographic technique and an etching technique, wherein the periodicity of the pattern of the diffraction grating can be changed at will by a change of the light-path length of one of the two light fluxes from a holographic exposing system.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.