Plasma processing method and apparatus for carrying out the same
US4808258A · kind A · utility
63Cited by
9References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 18, 1984 |
| Grant date | Feb 28, 1989 |
| Priority date | — |
| Expiry date | Oct 18, 2004 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32165
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing method and an apparatus for carrying out the method in which a processing gas is introduced into a processing chamber, and periodically an amplitude modulated or frequency-modulated high-frequency voltage is applied to plasma generating means, to generate a discharge plasma and to carry out predetermined processing by the plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.